| 193 nm Single-Frequency Frequency-Doubled Laser | ||||
|---|---|---|---|---|
| Technical Parameter | Unit | Technical Specifications | ||
| Min | Typical | Max | ||
| Central Wavelength | nm | – | 193.3 (Customizable) | – |
| Optical Mode | / | Single Longitudinal Mode, Continuous Wave | ||
| Output Power | mW | 1 | 2 | 3 |
| Linewidth | kHz | – | < 80 | |
| Output Power Stability (RMS) @ 2h | % | – | < 1 | |
| Output Power Adjustment | % | – | 50–100 | |
| Wavelength Tuning Range | pm | – | / | – |
| Side Mode Suppression Ratio | dB | 20 | 22 | 24 |
| Beam Quality | / | – | M² < 1.4 | |
| Operating Voltage | VAC | – | 90–250V (50–60Hz) | |
| Operating Temperature | °C | 20 | 25 | 30 |
| Output Type | / | – | Free-Space Optical Output | |
| Output Beam Diameter | mm | 0.8 | 1 | 1.2 |
| Beam Waist Position (Relative to Output Port) | m | – | < 1 | – |
| Dimensions | mm | 330(L) × 600(W) × 130(H) | ||
193 nm is one of the most demanding wavelengths in photonics. Generating coherent output here requires multi-stage frequency conversion, DUV-grade optics, and a fiber seed stable enough to preserve narrow linewidth through every conversion step.
Seed Laser Pro’s 193 nm Single-Frequency Laser delivers 1 to 3 mW of CW output at 193.3 nm. Linewidth stays below 80 kHz. Side-mode suppression ratio reaches 20 to 24 dB. The free-space output beam is clean, with M² below 1.4 and 1.0 mm diameter at the output port.
Built for semiconductor lithography research, precision microfabrication, DUV spectroscopy, and medical applications. Custom wavelength configurations are available on request.
PRODUCT FEATURES
- Deep UV Single-Frequency Output at 193.3 nm : Continuous-wave single longitudinal mode output in the deep ultraviolet. Coherent, stable, and fully solid-state. No gas mixtures. No high-voltage discharge. No fluorine handling.
- Sub-80 kHz Linewidth from Fiber Seed Architecture : Spectral purity inherited directly from the narrow-linewidth fiber seed. To optimize seeding for an ArF amplifier, linewidth must be controlled below 4 GHz. At sub-80 kHz, this laser sits three orders of magnitude inside that threshold.
- Active Power Stabilization : Output power stability within 1% RMS over two hours. Thermal and conversion efficiency drift in the DUV stage are actively compensated throughout continuous operation.
TYPICAL APPLICATIONS
- Semiconductor Lithography Research and Metrology : 193 nm is the wavelength of ArF excimer lithography, used across the industry for DUV patterning. This CW single-frequency source is not a production lithography laser. It serves as a coherent reference for optics metrology, interferometric wavefront testing, and defect inspection setups where excimer coherence is too limited.
- Precision Microfabrication : 193 nm photons carry 6.4 eV each. That energy level enables direct ablation of polymers, carbon compounds, and biological tissue. Thermal damage to surrounding material is minimal because energy coupling happens at the photochemical level rather than through heat.
- Medical Applications : 193 nm is the clinical wavelength for corneal reshaping in refractive surgery. Coherent CW output with stable power and narrow linewidth supports both surgical laser systems and the calibration and research setups around them.
- Deep UV Spectroscopy : Sub-80 kHz linewidth at 193 nm resolves fine spectral features in UV absorption spectra of molecules, ions, and semiconductor materials that broadband or incoherent DUV sources cannot distinguish.
Custom wavelength or output power required? The central wavelength is customizable. Custom power configurations and OEM integration support are available. Contact Seed Laser Pro’s engineering team at the design stage.

