| 193 nm Single-Frequency Frequency-Doubled Laser | ||||
|---|---|---|---|---|
| Technical Parameter | Unit | Technical Specifications | ||
| Min | Typical | Max | ||
| Central Wavelength | nm | – | 193.3 (Customizable) | – |
| Optical Mode | / | Single Longitudinal Mode, Continuous Wave | ||
| Output Power | mW | 1 | 2 | 3 |
| Linewidth | kHz | – | < 80 | |
| Output Power Stability (RMS) @ 2h | % | – | < 1 | |
| Output Power Adjustment | % | – | 50–100 | |
| Wavelength Tuning Range | pm | – | / | – |
| Side Mode Suppression Ratio | dB | 20 | 22 | 24 |
| Beam Quality | / | – | M² < 1.4 | |
| Operating Voltage | VAC | – | 90–250V (50–60Hz) | |
| Operating Temperature | °C | 20 | 25 | 30 |
| Output Type | / | – | Free-Space Optical Output | |
| Output Beam Diameter | mm | 0.8 | 1 | 1.2 |
| Beam Waist Position (Relative to Output Port) | m | – | < 1 | – |
| Dimensions | mm | 330(L) × 600(W) × 130(H) | ||
The 193 nm frequency-converted laser is a high-performance narrow-linewidth frequency-doubled laser developed by combining the company’s proprietary narrow-linewidth fiber laser with highly efficient and stable frequency conversion technology. It features excellent beam quality and high power stability.
Product Features
Deep Ultraviolet Generation Technology
Breakthrough Linewidth Control
Power Stabilization Technology
Typical Applications
Precision Processing
Medical Applications
Semiconductor Lithography
